摘要: To efficiently align the creation of defect center with photonics structure
in nanoscale precision is one of the outstanding challenges for realizing
high-performance photonic devices and the application in quantum technology
such as quantum sensing, scalable quantum systems, and quantum computing
network. Here, we propose a facile self-aligned patterning technique wholly
based on conventional engineering technology, with the doping precision can
reach ~15nm. Specifically, we demonstrate this technique by fabricating diamond
nanopillar sensor arrays, which show high consistency and near-optimal photon
counts, high yield approaching the theoretical limit, and high filtering
efficiency for different NV centers. Combined with appropriate crystal
orientation, a saturated fluorescence rate of 4.65 Mcps and the best reported
fluorescence-dependent detection sensitivity of 1900 cps^(-1/2) are achieved.
This technique applicable to all similar solid-state systems should facilitate
the development of parallel quantum sensing and scalable information
processing.