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ChinaXiv:202609.00433
1. Optical force lithography: A different approach for maskless micro/nano structures fabrication
2026-09-15 -
ChinaXiv:202607.00168
2. Phase Angle and Effective Second-Harmonic Generation Coefficient in Uniaxial Crystal
2026-07-20 -
ChinaXiv:202607.00176
3. Weak-Strong Steady-State Microbunching Accelerator Light Source
2026-07-14 -
ChinaXiv:202604.00354
4. Optical system for monocular focal-depth control
2026-04-27 -
ChinaXiv:202603.00003
5. Effective Second-Harmonic Generation Coefficient and C-eigenvalue of Nonlinear Susceptibility Tensors
2026-02-26
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